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Rapid Thermal Processing for Future Semiconductor Devices

av H. (Muroran Institute of Technology Fukuda
Rapid Thermal Processing for Future Semiconductor Devices av H. (Muroran Institute of Technology Fukuda
Om Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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  • Språk:
  • Engelska
  • ISBN:
  • 9780444513397
  • Format:
  • Häftad
  • Sidor:
  • 160
  • Utgiven:
  • 2. april 2003
  • Mått:
  • 234x156x9 mm.
  • Vikt:
  • 310 g.
  Fri leverans
Leveranstid: 2-4 veckor
Förväntad leverans: 1. september 2025

Om H. (Muroran Institute of Technology Fukuda

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Beskrivning av Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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